MOS Field-Effect-Transistors

Introduction

The n-type Metal-Oxide-Semiconductor Field-Effect-Transistor (nMOSFET) consists of a source and a drain, two highly conducting n-type semiconductor regions, which are isolated from the p-type substrate by reversed-biased p-n diodes. A metal or poly-crystalline gate covers the region between source and drain. The gate is separated from the semiconductor by the gate oxide. The basic structure of an n-type MOSFET and the corresponding circuit symbol are shown in Figure 7.1.1.
Figure 7.1.1 :Cross-section and circuit symbol of an n-type Metal-Oxide-Semiconductor-Field-Effect-Transistor (MOSFET)
As can be seen on the figure the source and drain regions are identical. It is the applied voltages, which determine which n-type region provides the electrons and becomes the source, while the other n-type region receives the electrons and becomes the drain. The voltages applied to the drain and gate electrode as well as to the substrate, by means of a back contact, are referred to the source potential, as also indicated Figure 7.1.1.
A conceptually similar structure was proposed and patented independently by Lilienfeld and Heil in 1930, but the MOSFET was not successfully demonstrated until 1960. The main technological problem was the control and reduction of the surface states at the oxide-semiconductor interface.
Initially, it was only possible to deplete an existing n-type channel by applying a negative voltage to the gate. Such devices have a conducting channel between source and drain even when no gate voltage is applied. They are called "depletion-mode" devices.
A reduction of the surface states enabled the fabrication of devices, which do not have a conducting channel unless a positive voltage is applied. Such devices are referred to as "enhancement-mode" devices. The electrons at the oxide-semiconductor interface are concentrated in a thin (~10 nm thick) "inversion" layer. By now, most MOSFETs are "enhancement-mode" devices.
While a minimum requirement for amplification of electrical signals is power gain, one finds that a device with both voltage and current gain is a highly desirable circuit element. The MOSFET provides current and voltage gain yielding an output current into an external load, which exceeds the input current, and an output voltage across that external load which exceeds the input voltage.
The current gain capability of a Field-Effect-Transistor (FET) is easily explained by the fact that no gate current is required to maintain the inversion layer and the resulting current between drain and source. The device has therefore an infinite current gain in dc. The current gain is inversely proportional to the signal frequency, reaching unity current gain at the transit frequency.
The voltage gain of the MOSFET is caused by the current saturation at higher drain-source voltages, so that a small drain-current variation can cause a large drain voltage variation.


Structure and principle of operation

A top view of the same MOSFET is shown in Figure 7.2.1, where the gate length, L, and gate width, W, are identified. Note that the gate length does not equal the physical dimension of the gate, but rather the distance between the source and drain regions underneath the gate. The overlap between the gate and the source/drain region is required to ensure that the inversion layer forms a continuous conducting path between the source and drain region. Typically this overlap is made as small as possible in order to minimize its parasitic capacitance.
Figure 7.2.1 :Top view of an n-type Metal-Oxide-Semiconductor- Field-Effect-Transistor (MOSFET)
The voltage applied to the gate controls the flow of electrons from the source to the drain. A positive voltage applied to the gate attracts electrons to the interface between the gate dielectric and the semiconductor. These electrons form a conducting channel called the inversion layer. No gate current is required to maintain the inversion layer at the interface since the gate oxide blocks any carrier flow. The net result is that the applied gate voltage controls the current between drain and source.
The typical current versus voltage (I-V) characteristics of a MOSFET are shown in Figure 7.2.2.
Figure 7.2.2 :I-V characteristics of an n-type MOSFET with VG = 5 V (top curve), 4 V, 3 V and 2 V (bottom curve)
NOTE: We will primarily consider the n-type or n-channel MOSFET in this chapter. This type of MOSFET is fabricated on a p-type semiconductor substrate. The complementary MOSFET is the p-type or p-channel MOSFET. The p-type MOSFET contains p-type source and drain regions in an n-type substrate. The inversion layer is formed when holes are attracted to the interface by a negative gate voltage. While the holes still flow from source to drain, they result in a negative drain current. CMOS circuits require both n-type and p-type MOSFETs.


MOSFET analysis

7.3.1. The linear model
7.3.2. The quadratic model
7.3.3. The variable depletion layer model
In this section, we present three different models for the MOSFET, the linear model, the quadratic model and the variable depletion layer model. The linear model correctly predicts the MOSFET behavior for small drain-source voltages, where the MOSFET acts as a variable resistor. The quadratic model includes the voltage variation along the channel between source and drain. This model is most commonly used despite the fact that the variation of the depletion layer charge is ignored. The variable depletion layer model is more complex as it includes the variation of the depletion layer along the channel.

7.3.1. The linear model

Next Subsection
The linear model describes the behavior of a MOSFET biased with a small drain-to-source voltage. As the name suggests, the linear model, describes the MOSFET acting as a linear device. More specifically, it can be modeled as a linear resistor whose resistance is modulated by the gate-to-source voltage. In this regime, the MOSFET can be used as a switch for analog and digital signals or as an analog multiplier.
The general expression for the drain current equals the total charge in the inversion layer divided by the time the carriers need to flow from the source to the drain:
(7.3.1)
where Qinv is the inversion layer charge per unit area, W is the gate width, L is the gate length and tr is the transit time. If the velocity of the carriers is constant between source and drain, the transit time equals:
(7.3.2)
where the velocity, v, equals the product of the mobility and the electric field:
(7.3.3)
The constant velocity also implies a constant electric field so that the field equals the drain-source voltage divided by the gate length. This leads to the following expression for the drain current:
(7.3.4)
We now assume that the charge density in the inversion layer is constant between source and drain. We also assume that the basic assumption described in section 6.3.2 applies, namely that the charge density in the inversion layer equals minus the product of the capacitance per unit area and the gate-to-source voltage minus the threshold voltage:
(7.3.5)
The inversion layer charge is zero if the gate voltage is lower than the threshold voltage. Replacing the inversion layer charge density in the expression for the drain current yields the linear model:
(7.3.6)
Note that the capacitance in the above equations is the gate oxide capacitance per unit area. Also note that the drain current is zero if the gate-to-source voltage is less than the threshold voltage. The linear model is only valid if the drain-to-source voltage is much smaller than the gate-to-source voltage minus the threshold voltage. This insures that the velocity, the electric field and the inversion layer charge density is indeed constant between the source and the drain.
An example of the linear current-versus-voltage (I-V) characteristics of a MOSFET is shown in Figure 7.3.1.
Figure 7.3.1 :Linear I-V characteristics of a MOSFET with VT = 1 V. (mn = 300 cm2/V-s, W/L = 5 and tox = 20 nm). click here for spreadsheet
The figure illustrates the behavior of the device in the linear regime: While there is no drain current if the gate voltage is less than the threshold voltage, the current increases with gate voltage once it is larger than the threshold voltage. The slope of the curves equals the conductance of the device, which increases linearly with the applied gate voltage. The figure therefore illustrates the use of a MOSFET as a voltage-controlled resistor.

7.3.2. The quadratic model

Next Subsection
The quadratic model uses the same assumptions as the linear model. However, this model allows the inversion layer charge to vary between the source and the drain.
The derivation is based on the fact that the current is continuous throughout the channel. The current is also related to the local channel voltage, >I>VC.
We now consider a small section within the device with width dy>/I> and channel voltage VC + VS. The linear model as described by equation (7.3.6), still applies to such section, yielding:
(7.3.7)
where the drain-source voltage is replaced by the channel voltage. Both sides of the equation can be integrated from the source to the drain, so that y varies from 0 to the gate length, L, and the channel voltage VC varies from 0 to the drain-source voltage, VDS.
(7.3.8)
The drain current, ID, is constant so that integration results in:
(7.3.9)
The drain current first increases linearly with the applied drain-to-source voltage, but then reaches a maximum value. According to the above equation the current would even decrease and eventually become negative. The charge density at the drain end of the channel is zero at that maximum and changes sign as the drain current decreases. As explained in section 6.2, the charge in the inversion layer does go to zero and reverses its sign as holes are accumulated at the interface. However, these holes cannot contribute to the drain current since the reversed-biased p-n diode between the drain and the substrate blocks any flow of holes into the drain. Instead the current reaches its maximum value and maintains that value for higher drain-to-source voltages. A depletion layer located at the drain end of the gate accommodates the additional drain-to-source voltage. This behavior is referred to as drain current saturation.
Drain current saturation therefore occurs when the drain-to-source voltage equals the gate-to-source voltage minus the threshold voltage. The value of the saturated drain current, ID,sat. is then given by the following equation:
(7.3.10)
The quadratic model explains the typical current-voltage characteristics of a MOSFET, which are normally plotted for different gate-to-source voltages. An example is shown in Figure 7.3.2. The saturation occurs to the right of the dotted line which is given by ID = m Cox W/L VDS2.
Figure 7.3.2:Current-Voltage characteristics of an n-type MOSFET as obtained with the quadratic model. The dotted line separates the quadratic region of operation on the left from the saturation region on the right. click here for spreadsheet
The drain current is still zero if the gate voltage is less than the threshold voltage.
(7.3.11)
For negative drain-source voltages, the transistor is in the quadratic regime and is described by equation (7.3.9). However, it is possible to forward bias the drain-bulk p-n junction. A complete circuit model should therefore also include the p-n diodes between the source, the drain and the substrate.
We now use the quadratic model used to calculate some of the small signal parameters, namely the transconductance, gm and the output conductance, gd.
The transconductance quantifies the drain current variation with a gate-source voltage variation while keeping the drain-source voltage constant, or:
(7.3.12)
The transconductance in the quadratic region is given by:
(7.3.13)
which is proportional to the drain-source voltage for VDS < VGS - VT. In saturation, the transconductance is constant and equals:
(7.3.14)
The output conductance quantifies the drain current variation with a drain-source voltage variation while keeping the gate-source voltage constant, or:
(7.3.15)
The output conductance in the quadratic region decreases with increasing drain-source voltage:
(7.3.16)
and becomes zero as the device is operated in the saturated region:
(7.3.17)
Example 7.1Calculate the drain current of a silicon nMOSFET with VT = 1 V, W = 10 mm, L = 1 mm and tox = 20 nm. The device is biased with VGS = 3 V and VDS = 5 V. Use the quadratic model, a surface mobility of 300 cm2/V-s and set VBS = 0 V.Also calculate the transconductance at VGS = 3 V and VDS = 5 V and compare it to the output conductance at VGS = 3 V and VDS = 0 V.
SolutionThe MOSFET is biased in saturation since VDS > VGS - VT.
Therefore the drain current equals:
The transconductance equals:
and the output conductance equals:
The measured drain current in saturation is not constant as predicted by the quadratic model. Instead it increases with drain-source voltage due to channel length modulation, drain induced barrier lowering or two-dimensional field distributions, as discussed in section 7.7. A simple empirical model, which considers these effects, is given by:
(7.3.18)
Where l is a fitting parameter.

7.3.3. The variable depletion layer model

Next Subsection
Next, we develop the variable depletion layer model, which includes the variation of the charge in the depletion layer between the source and drain. This variation is caused by the voltage variation along the channel. The inversion layer charge is still given by:
(7.3.19)
where we now include the implicit dependence of the threshold voltage on the charge in the depletion region, or:
(7.3.20)
The voltage VC is the difference between the voltage within the channel and the source voltage. We can now apply the linear model to a small section at a distance y from the source and with a thickness dy. The voltage at that point equals VC + VS while the voltage across that section equals dVC. This results in the following expression for the drain current, ID:
(7.3.21)
Both sides of the equation can be integrated from the source to the drain with y varying from 0 to the gate length, L, and the channel voltage, VC varying from 0 to the drain-source voltage, VDS. This results in:
(7.3.22)
Integration yields the following drain current:
(7.3.23)
The current-voltage characteristics as obtained with the above equation are shown in Figure 7.3.3, together with those obtained with the quadratic model. Again, it was assumed that the drain current saturates at its maximum value, since a positive inversion layer charge cannot exist in an n-type MOSFET. The drain voltage at which saturation occurs is given by:
(7.3.24)
Figure 7.3.3 :Comparison of the quadratic model (upper curves) and the variable depletion layer model (lower curves) click here for spreadsheet
The figure shows a clear difference between the two models: the quadratic model yields a larger drain current compared to the more accurate variable depletion layer charge model. The transconductance is still given by equation (7.3.13). This equation combined with the saturation voltage (equation (7.3.24)) yields:
(7.3.25)
This transconductance is almost linearly dependent on VGS, so that it can still be written in the form of equation (7.3.10) with a modified mobility mn*:
(7.3.26)
Where mn* equals:
(7.3.27)
The term under the square root depends on the ratio of the oxide capacitance to the depletion layer capacitance at the onset of inversion. Since this ratio is larger than one in most transistors, the modified mobility is 10% to 40% smaller than the actual mobility. This effective mobility can also be used with the quadratic model, yielding a simple but reasonably accurate model for the MOSFET.
Example 7.2Repeat example 7.1 using the variable depletion layer model. Use VFB = -0.807 V and Na = 1017 cm-3.
SolutionTo find out whether the MOSFET is biased in saturation, one first calculates the saturation voltage, VD,sat:
The drain current is then obtained from:
The transconductance equals:
corresponding to a modified mobility mn* = 149 cm2/V-s.The output conductance at VDS = 0 V equals:
Which is the same as that of example 7.1 since the depletion layer width is constant for VDS = 0.

Threshold voltage

7.4.1. Threshold voltage calculation
7.4.2. The substrate bias effect
In this section we summarize the calculation of the threshold voltage and discuss the dependence of the threshold voltage on the bias applied to the substrate, called the substrate bias effect.

7.4.1. Threshold voltage calculation

Next Subsection
The threshold voltage equals the sum of the flatband voltage, twice the bulk potential and the voltage across the oxide due to the depletion layer charge, or:
(7.4.1)
where the flatband voltage, VFB, is given by:
(7.4.2)
With
(7.4.3)
and
(7.4.4)
The threshold voltage of a p-type MOSFET with an n-type substrate is obtained using the following equations:
(7.4.5)
where the flatband voltage, VFB, is given by:
(7.4.6)
With
(7.4.7)
and
(7.4.8)
The threshold voltage dependence on the doping density is illustrated with Figure 7.4.1 for both n-type and p-type MOSFETs with an aluminum gate metal.
Figure 7.4.1 :Threshold voltage of n-type (upper curve) and p-type (lower curve) MOSFETs versus substrate doping density. click here for spreadsheet
The threshold of both types of devices is slightly negative at low doping densities and differs by 4 times the absolute value of the bulk potential. The threshold of nMOSFETs increases with doping while the threshold of pMOSFETs decreases with doping in the same way. A variation of the flatband voltage due to oxide charge will cause a reduction of both threshold voltages if the charge is positive and an increase if the charge is negative.

7.4.2. The substrate bias effect

Next Subsection
The voltage applied to the back contact affects the threshold voltage of a MOSFET. The voltage difference between the source and the bulk, VBS changes the width of the depletion layer and therefore also the voltage across the oxide due to the change of the charge in the depletion region. This results in a modified expression for the threshold voltage, as given by:
(7.4.9)
The threshold difference due to an applied source-bulk voltage can therefore be expressed by:
(7.4.10)
Where g is the body effect parameter given by:
(7.4.11)
The variation of the threshold voltage with the applied bulk-to-source voltage can be observed by plotting the transfer curve for different bulk-to-source voltages. The expected characteristics, as calculated using the quadratic model and the variable depletion layer model, are shown in Figure 7.4.2.
Figure 7.4.2 :Square root of ID versus the gate-source voltage as calculated using the quadratic model (upper curves) and the variable depletion layer model (lower curves). click here for spreadsheet
First, we observe that the threshold shift is the same for both models. For a device biased at the threshold voltage, drain saturation is obtained at zero drain-to-source voltage so that the depletion layer width is constant along the channel. As the drain-source voltage at saturation is increased, there is an increasing difference between the drain current as calculated with each model. The difference however reduces as a more negative bulk-source voltage is applied. This is due to the larger depletion layer width, which reduces the relative variation of the depletion layer charge along the channel.
Example 7.3Calculate the threshold voltage of a silicon nMOSFET when applying a substrate voltage, VBS = 0, -2.5, -5, -7.5 and -10 V. The capacitor has a substrate doping Na = 1017 cm-3, a 20 nm thick oxide (eox = 3.9 e0) and an aluminum gate (FM = 4.1 V). Assume there is no fixed charge in the oxide or at the oxide-silicon interface.
SolutionThe threshold voltage at VBS = -2.5 V equals:
Where the flatband voltage without substrate bias, VT0, was already calculated in example 6.2. The body effect parameter was obtained from:
The threshold voltages for the different substrate voltages are listed in the table below.

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