Structure and principle of operation
A top view of the same MOSFET is shown in Figure 7.2.1, where the gate length, L, and gate width, W,
are identified. Note that the gate length does not equal the physical
dimension of the gate, but rather the distance between the source and
drain regions underneath the gate. The overlap between the gate and the
source/drain region is required to ensure that the inversion layer forms
a continuous conducting path between the source and drain region.
Typically this overlap is made as small as possible in order to minimize
its parasitic capacitance. |
Figure 7.2.1 : | Top view of an n-type Metal-Oxide-Semiconductor- Field-Effect-Transistor (MOSFET) |
The voltage applied to
the gate controls the flow of electrons from the source to the drain. A
positive voltage applied to the gate attracts electrons to the
interface between the gate dielectric and the semiconductor. These
electrons form a conducting channel called the inversion layer. No gate
current is required to maintain the inversion layer at the interface
since the gate oxide blocks any carrier flow. The net result is that the
applied gate voltage controls the current between drain and source. |
The typical current versus voltage (I-V) characteristics of a MOSFET are shown in Figure 7.2.2. |
Figure 7.2.2 : | I-V characteristics of an n-type MOSFET with VG = 5 V (top curve), 4 V, 3 V and 2 V (bottom curve) |
NOTE: We will primarily consider the n-type or n-channel MOSFET in this chapter. This type of MOSFET is fabricated on a p-type semiconductor substrate. The complementary MOSFET is the p-type or p-channel MOSFET. The p-type MOSFET contains p-type source and drain regions in an n-type
substrate. The inversion layer is formed when holes are attracted to
the interface by a negative gate voltage. While the holes still flow
from source to drain, they result in a negative drain current. CMOS
circuits require both n-type and p-type MOSFETs. |
MOSFET analysis
7.3.1. The linear model
7.3.2. The quadratic model
7.3.3. The variable depletion layer model
In this section, we
present three different models for the MOSFET, the linear model, the
quadratic model and the variable depletion layer model. The linear model
correctly predicts the MOSFET behavior for small drain-source voltages,
where the MOSFET acts as a variable resistor. The quadratic model
includes the voltage variation along the channel between source and
drain. This model is most commonly used despite the fact that the
variation of the depletion layer charge is ignored. The variable
depletion layer model is more complex as it includes the variation of
the depletion layer along the channel. |
The linear model
describes the behavior of a MOSFET biased with a small drain-to-source
voltage. As the name suggests, the linear model, describes the MOSFET
acting as a linear device. More specifically, it can be modeled as a
linear resistor whose resistance is modulated by the gate-to-source
voltage. In this regime, the MOSFET can be used as a switch for analog
and digital signals or as an analog multiplier. |
The general expression
for the drain current equals the total charge in the inversion layer
divided by the time the carriers need to flow from the source to the
drain: |
 | (7.3.1) |
where Qinv is the inversion layer charge per unit area, W is the gate width, L is the gate length and tr is the transit time. If the velocity of the carriers is constant between source and drain, the transit time equals: |
 | (7.3.2) |
where the velocity, v, equals the product of the mobility and the electric field: |
 | (7.3.3) |
The constant velocity
also implies a constant electric field so that the field equals the
drain-source voltage divided by the gate length. This leads to the
following expression for the drain current: |
 | (7.3.4) |
We now assume that the
charge density in the inversion layer is constant between source and
drain. We also assume that the basic assumption described in section 6.3.2
applies, namely that the charge density in the inversion layer equals
minus the product of the capacitance per unit area and the
gate-to-source voltage minus the threshold voltage: |
 | (7.3.5) |
The inversion layer
charge is zero if the gate voltage is lower than the threshold voltage.
Replacing the inversion layer charge density in the expression for the
drain current yields the linear model: |
 | (7.3.6) |
Note that the
capacitance in the above equations is the gate oxide capacitance per
unit area. Also note that the drain current is zero if the
gate-to-source voltage is less than the threshold voltage. The linear
model is only valid if the drain-to-source voltage is much smaller than
the gate-to-source voltage minus the threshold voltage. This insures
that the velocity, the electric field and the inversion layer charge
density is indeed constant between the source and the drain. |
An example of the linear current-versus-voltage (I-V) characteristics of a MOSFET is shown in Figure 7.3.1. |
Figure 7.3.1 : | Linear I-V characteristics of a MOSFET with VT = 1 V. (mn = 300 cm2/V-s, W/L = 5 and tox = 20 nm).  |
The figure illustrates
the behavior of the device in the linear regime: While there is no
drain current if the gate voltage is less than the threshold voltage,
the current increases with gate voltage once it is larger than the
threshold voltage. The slope of the curves equals the conductance of the
device, which increases linearly with the applied gate voltage. The
figure therefore illustrates the use of a MOSFET as a voltage-controlled
resistor. |
7.3.2. The quadratic model
|     |
The quadratic model
uses the same assumptions as the linear model. However, this model
allows the inversion layer charge to vary between the source and the
drain. |
The derivation is
based on the fact that the current is continuous throughout the channel.
The current is also related to the local channel voltage, >I>VC. |
We now consider a small section within the device with width dy>/I> and channel voltage VC + VS. The linear model as described by equation (7.3.6), still applies to such section, yielding: |
 | (7.3.7) |
where the drain-source
voltage is replaced by the channel voltage. Both sides of the equation
can be integrated from the source to the drain, so that y varies from 0 to the gate length, L, and the channel voltage VC varies from 0 to the drain-source voltage, VDS. |
 | (7.3.8) |
The drain current, ID, is constant so that integration results in: |
 | (7.3.9) |
The drain current
first increases linearly with the applied drain-to-source voltage, but
then reaches a maximum value. According to the above equation the
current would even decrease and eventually become negative. The charge
density at the drain end of the channel is zero at that maximum and
changes sign as the drain current decreases. As explained in section 6.2,
the charge in the inversion layer does go to zero and reverses its sign
as holes are accumulated at the interface. However, these holes cannot
contribute to the drain current since the reversed-biased p-n diode
between the drain and the substrate blocks any flow of holes into the
drain. Instead the current reaches its maximum value and maintains that
value for higher drain-to-source voltages. A depletion layer located at
the drain end of the gate accommodates the additional drain-to-source
voltage. This behavior is referred to as drain current saturation. |
Drain current
saturation therefore occurs when the drain-to-source voltage equals the
gate-to-source voltage minus the threshold voltage. The value of the
saturated drain current, ID,sat. is then given by the following equation: |
 | (7.3.10) |
The quadratic model
explains the typical current-voltage characteristics of a MOSFET, which
are normally plotted for different gate-to-source voltages. An example
is shown in Figure 7.3.2. The saturation occurs to the right of the dotted line which is given by ID = m Cox W/L VDS2. |
Figure 7.3.2: | Current-Voltage characteristics of an n-type
MOSFET as obtained with the quadratic model. The dotted line separates
the quadratic region of operation on the left from the saturation region
on the right.  |
The drain current is still zero if the gate voltage is less than the threshold voltage. |
 | (7.3.11) |
For negative drain-source voltages, the transistor is in the quadratic regime and is described by equation (7.3.9).
However, it is possible to forward bias the drain-bulk p-n junction. A
complete circuit model should therefore also include the p-n diodes
between the source, the drain and the substrate. |
We now use the quadratic model used to calculate some of the small signal parameters, namely the transconductance, gm and the output conductance, gd. |
The transconductance
quantifies the drain current variation with a gate-source voltage
variation while keeping the drain-source voltage constant, or: |
 | (7.3.12) |
The transconductance in the quadratic region is given by: |
 | (7.3.13) |
which is proportional to the drain-source voltage for VDS < VGS - VT. In saturation, the transconductance is constant and equals: |
 | (7.3.14) |
The output conductance
quantifies the drain current variation with a drain-source voltage
variation while keeping the gate-source voltage constant, or: |
 | (7.3.15) |
The output conductance in the quadratic region decreases with increasing drain-source voltage: |
 | (7.3.16) |
and becomes zero as the device is operated in the saturated region: |
 | (7.3.17) |
Example 7.1 | Calculate the drain current of a silicon nMOSFET with VT = 1 V, W = 10 mm, L = 1 mm and tox = 20 nm. The device is biased with VGS = 3 V and VDS = 5 V. Use the quadratic model, a surface mobility of 300 cm2/V-s and set VBS = 0 V.Also calculate the transconductance at VGS = 3 V and VDS = 5 V and compare it to the output conductance at VGS = 3 V and VDS = 0 V. |
Solution | The MOSFET is biased in saturation since VDS > VGS - VT.
Therefore the drain current equals:
The transconductance equals:
and the output conductance equals:
|
The measured drain
current in saturation is not constant as predicted by the quadratic
model. Instead it increases with drain-source voltage due to channel
length modulation, drain induced barrier lowering or two-dimensional
field distributions, as discussed in section 7.7. A simple empirical model, which considers these effects, is given by: |
 | (7.3.18) |
Where l is a fitting parameter. |
7.3.3. The variable depletion layer model
|     |
Next, we develop the
variable depletion layer model, which includes the variation of the
charge in the depletion layer between the source and drain. This
variation is caused by the voltage variation along the channel. The
inversion layer charge is still given by: |
 | (7.3.19) |
where we now include the implicit dependence of the threshold voltage on the charge in the depletion region, or: |
 | (7.3.20) |
The voltage VC
is the difference between the voltage within the channel and the source
voltage. We can now apply the linear model to a small section at a
distance y from the source and with a thickness dy. The voltage at that point equals VC + VS while the voltage across that section equals dVC. This results in the following expression for the drain current, ID: |
 | (7.3.21) |
Both sides of the equation can be integrated from the source to the drain with y varying from 0 to the gate length, L, and the channel voltage, VC varying from 0 to the drain-source voltage, VDS. This results in: |
 | (7.3.22) |
Integration yields the following drain current: |
 | (7.3.23) |
The current-voltage characteristics as obtained with the above equation are shown in Figure 7.3.3,
together with those obtained with the quadratic model. Again, it was
assumed that the drain current saturates at its maximum value, since a
positive inversion layer charge cannot exist in an n-type MOSFET. The drain voltage at which saturation occurs is given by: |
 | (7.3.24) |
Figure 7.3.3 : | Comparison of the quadratic model (upper curves) and the variable depletion layer model (lower curves)  |
The figure shows a
clear difference between the two models: the quadratic model yields a
larger drain current compared to the more accurate variable depletion
layer charge model. The transconductance is still given by equation (7.3.13). This equation combined with the saturation voltage (equation (7.3.24)) yields: |
 | (7.3.25) |
This transconductance is almost linearly dependent on VGS, so that it can still be written in the form of equation (7.3.10) with a modified mobility mn*: |
 | (7.3.26) |
 | (7.3.27) |
The term under the
square root depends on the ratio of the oxide capacitance to the
depletion layer capacitance at the onset of inversion. Since this ratio
is larger than one in most transistors, the modified mobility is 10% to
40% smaller than the actual mobility. This effective mobility can also
be used with the quadratic model, yielding a simple but reasonably
accurate model for the MOSFET. |
Example 7.2 | Repeat example 7.1 using the variable depletion layer model. Use VFB = -0.807 V and Na = 1017 cm-3. |
Solution | To find out whether the MOSFET is biased in saturation, one first calculates the saturation voltage, VD,sat:
The drain current is then obtained from:
The transconductance equals:
corresponding to a modified mobility mn* = 149 cm2/V-s.The output conductance at VDS = 0 V equals:
Which is the same as that of example 7.1 since the depletion layer width is constant for VDS = 0.
|
Threshold voltage
7.4.1. Threshold voltage calculation
7.4.2. The substrate bias effect
In this section we
summarize the calculation of the threshold voltage and discuss the
dependence of the threshold voltage on the bias applied to the
substrate, called the substrate bias effect. |
7.4.1. Threshold voltage calculation
|     |
The threshold voltage
equals the sum of the flatband voltage, twice the bulk potential and the
voltage across the oxide due to the depletion layer charge, or: |
 | (7.4.1) |
where the flatband voltage, VFB, is given by: |
 | (7.4.2) |
 | (7.4.3) |
 | (7.4.4) |
The threshold voltage of a p-type MOSFET with an n-type substrate is obtained using the following equations: |
 | (7.4.5) |
where the flatband voltage, VFB, is given by: |
 | (7.4.6) |
 | (7.4.7) |
 | (7.4.8) |
The threshold voltage dependence on the doping density is illustrated with Figure 7.4.1 for both n-type and p-type MOSFETs with an aluminum gate metal. |
Figure 7.4.1 : | Threshold voltage of n-type (upper curve) and p-type (lower curve) MOSFETs versus substrate doping density.  |
The threshold of both
types of devices is slightly negative at low doping densities and
differs by 4 times the absolute value of the bulk potential. The
threshold of nMOSFETs increases with doping while the threshold of
pMOSFETs decreases with doping in the same way. A variation of the
flatband voltage due to oxide charge will cause a reduction of both
threshold voltages if the charge is positive and an increase if the
charge is negative. |
7.4.2. The substrate bias effect
|     |
The voltage applied to
the back contact affects the threshold voltage of a MOSFET. The voltage
difference between the source and the bulk, VBS
changes the width of the depletion layer and therefore also the voltage
across the oxide due to the change of the charge in the depletion
region. This results in a modified expression for the threshold voltage,
as given by: |
 | (7.4.9) |
The threshold difference due to an applied source-bulk voltage can therefore be expressed by: |
 | (7.4.10) |
Where g is the body effect parameter given by: |
 | (7.4.11) |
The variation of the
threshold voltage with the applied bulk-to-source voltage can be
observed by plotting the transfer curve for different bulk-to-source
voltages. The expected characteristics, as calculated using the
quadratic model and the variable depletion layer model, are shown in
Figure 7.4.2. |
Figure 7.4.2 : | Square root of ID
versus the gate-source voltage as calculated using the quadratic model
(upper curves) and the variable depletion layer model (lower curves).  |
First, we observe that
the threshold shift is the same for both models. For a device biased at
the threshold voltage, drain saturation is obtained at zero
drain-to-source voltage so that the depletion layer width is constant
along the channel. As the drain-source voltage at saturation is
increased, there is an increasing difference between the drain current
as calculated with each model. The difference however reduces as a more
negative bulk-source voltage is applied. This is due to the larger
depletion layer width, which reduces the relative variation of the
depletion layer charge along the channel. |
Example 7.3 | Calculate the threshold voltage of a silicon nMOSFET when applying a substrate voltage, VBS = 0, -2.5, -5, -7.5 and -10 V. The capacitor has a substrate doping Na = 1017 cm-3, a 20 nm thick oxide (eox = 3.9 e0) and an aluminum gate (FM = 4.1 V). Assume there is no fixed charge in the oxide or at the oxide-silicon interface. |
Solution | The threshold voltage at VBS = -2.5 V equals:
Where the flatband voltage without substrate bias, VT0, was already calculated in example 6.2. The body effect parameter was obtained from:
The threshold voltages for the different substrate voltages are listed in the table below.
|
|
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